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Electronic Resource

Chemical solution deposition of functional oxide thin films

Schneller, Theodor - Nama Orang; Waser, Rainer - Nama Orang; Kosec, Marija - Nama Orang; Payne, David - Nama Orang;

This is the first text to cover all aspects of solution processed functional oxide thin-films. Chemical Solution Deposition (CSD) comprises all solution based thin- film deposition techniques, which involve chemical reactions of precursors during the formation of the oxide films, i. e. sol-gel type routes, metallo-organic decomposition routes, hybrid routes, etc. While the development of sol-gel type processes for optical coatings on glass by silicon dioxide and titanium dioxide dates from the mid-20th century, the first CSD derived electronic oxide thin films, such as lead zirconate titanate, were prepared in the 1980’s. Since then CSD has emerged as a highly flexible and cost-effective technique for the fabrication of a very wide variety of functional oxide thin films. Application areas include, for example, integrated dielectric capacitors, ferroelectric random access memories, pyroelectric infrared detectors, piezoelectric micro-electromechanical systems, antireflective coatings, optical filters, conducting-, transparent conducting-, and superconducting layers, luminescent coatings, gas sensors, thin film solid-oxide fuel cells, and photoelectrocatalytic solar cells. In the appendix detailed “cooking recipes” for selected material systems are offered.


Ketersediaan
#
Perpustakaan Pusat E190
E190
Tersedia
Informasi Detail
Judul Seri
-
No. Panggil
E190
Penerbit
Vienna : Springer., 2014
Deskripsi Fisik
XVII, 796 lembar : il. warna
Bahasa
English
ISBN/ISSN
9783211993118
Klasifikasi
NONE
Tipe Isi
text
Tipe Media
computer
Tipe Pembawa
online resource
Edisi
-
Subjek
Larutan Kimia
Oksida
Info Detail Spesifik
-
Pernyataan Tanggungjawab
Theodor Schneller, Rainer Waser, Marija Kosec, David Payne
Versi lain/terkait

Tidak tersedia versi lain

Lampiran Berkas
  • Chemical solution deposition of functional oxide thin films
    https://doi.org/10.1007/978-3-211-99311-8
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